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Plasma Enhanced Chemical Vapor Deposition


PECVD is one half of a Nanomaster combination PECVD and RIE machine. 

8” platen

Up to 500°C

600W RF

SiH4 NH3 N2O O2 N2 CF4

Deposition of SiO2 and Si3N4

Binghamton University State University of New York
PO BOX 6000   Binghamton, NY 13902-6000

Last Updated: 2/10/17