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Available Target materials:

Ag, Al2O3, AlZnO, Cr, Ge, GIZO, HfO2, LiNbO3, Mo, NiCr, Si, Sn, Ti, TiO2, V, ZnO


Sputter Deposition


4” substrate maximum

System has five 2” targets,

Three RF and two DC “guns” can co-sputter from any combination

DC – 500W

RF – 300W

Substrate heater – up to 800°C

Can bias the substrate holder – 50W RF

Computer control

Binghamton University State University of New York
PO BOX 6000   Binghamton, NY 13902-6000

Last Updated: 2/10/17